Nano imprint main body (Mold table αβadjustment mold feature)
High accuracy XYθwafer stage
Wafer curved feature and XY stage
Microscope alignment x 2
Constant temperature and humidity instrument
Ionizer
Mass flow controller x 4 (TFP, CTFP, Nitrogen and Helium)
UV light source
Digital camera
Mold size : 22, 50, 75mm (Valid 70-72mm angle) (Quartz 6.35mm thickness trapezoid)
Wafer size : 8 inch Si wafer (725um thickness), 200mm angle glass substrate (0.55-1.2mm thickenss)
Welding pressure : 10-250N(22mm angle 49N 0.1MPa, 50mm angle 250N 0.1MPa, 75mm angle 0.05MPa)
Parallel light for LED-UV light source (365mm Φ4 inch area, over 10mJ/cm2)
Alignment accuracy : Pre alignment lower 1um(Pattern and edge detection)
Precision alignment under 100nm (Moire detection)
Precision XY stage for alignment : Motion space 120 x 120mm, Resolution under 10nm
Precisionθstage for alignment : Motion space, resolution faster than 0.25 sec (under 0.00007°)